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Michael W. Stan
Sr. Technical Sales Representative at Kayaku Advanced Materials Inc
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 4 August 1993 Paper
Understanding, quantifying, and reducing photospeed test error through technical partnerships and experimental design
Mark Wirzbicki, James Lekas, Jesus Cuellar, Charlie Paddock, Mark Seliger, Michael Stan
Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.149005
KEYWORDS: Semiconducting wafers, Photoresist materials, Signal to noise ratio, Signal processing, Manufacturing, Control systems, Photoresist developing, Humidity, Data modeling, Environmental monitoring
Conference Committee Involvement (6)
Metrology, Inspection, and Process Control for Microlithography XXII
25 February 2008 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXI
26 February 2007 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XX
20 February 2006 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XIX
28 February 2005 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XVIII
23 February 2004 | Santa Clara, California, United States
Showing 5 of 6 Conference Committees
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