Mr. Michael W. Stan
Sr. Technical Sales Representative at MicroChem Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (1)

PROCEEDINGS ARTICLE | August 4, 1993
Proc. SPIE. 1926, Integrated Circuit Metrology, Inspection, and Process Control VII
KEYWORDS: Signal to noise ratio, Environmental monitoring, Data modeling, Manufacturing, Control systems, Photoresist materials, Humidity, Signal processing, Semiconducting wafers, Photoresist developing

Conference Committee Involvement (6)
Metrology, Inspection, and Process Control for Microlithography XXII
25 February 2008 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXI
26 February 2007 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XX
20 February 2006 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XIX
28 February 2005 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XVIII
23 February 2004 | Santa Clara, California, United States
Showing 5 of 6 published special sections
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