Michael D. Tittnich
Director of Technical Operations at IBM Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 13 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Lithography, Photoresist materials, Manufacturing, Optical lithography, Semiconducting wafers, Photoresist developing, Photomasks

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Semiconducting wafers, Mirrors, Printing, Sensors, Stray light, Cameras, Reticles

Proceedings Article | 15 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Photomasks, Contamination, Reflectivity, Microscopes, Image resolution, Manufacturing, Lithography

Proceedings Article | 13 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Photomasks, Reflectivity, Tin, Reliability

Proceedings Article | 22 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Nanotechnology, Immersion lithography, Water, Lithography, Semiconductors, Semiconducting wafers, Photoresist developing, Thin film coatings, Scanners, Photoresist materials

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