Dr. Michael Yeung Profile

Dr. Michael Yeung

President at Fastlitho

SPIE Involvement:

Author

Publications (47)

Proceedings Article | 28 April 2023 Paper

Binary solution for optimization of pixelated EUV source using constrained mathematical programming

Michael Yeung, Eytan Barouch

Proceedings Volume 12494, 124940K (2023) https://doi.org/10.1117/12.2659099

KEYWORDS: Binary data, Interpolation, Extreme ultraviolet, Matrices, Semiconducting wafers, Nanoimprint lithography, Diffraction, Computer programming, Mathematical optimization, Source mask optimization

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Proceedings Article | 26 March 2019 Paper

Development of fast rigorous simulator for large-area EUV lithography simulation

Michael Yeung, Eytan Barouch

Proceedings Volume 10957, 109571D (2019) https://doi.org/10.1117/12.2515079

KEYWORDS: Deep ultraviolet, Extreme ultraviolet lithography, Finite-difference time-domain method, Extreme ultraviolet, Computer simulations, Lithography, Computational electromagnetics

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SPIE Journal Paper | 12 October 2017

Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle

Guk-Jin Kim, In-Seon Kim, Sung-Gyu Lee, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 16, Issue 04, 041008, (October 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041008

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

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Proceedings Article | 24 March 2017 Paper

Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 10143, 101431V (2017) https://doi.org/10.1117/12.2258189

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Silicon, Silicon carbide

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Proceedings Article | 24 March 2017 Paper

Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 10143, 101431P (2017) https://doi.org/10.1117/12.2258188

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Optical lithography, Optical proximity correction, EUV optics, Photomasks, Wafer-level optics, Reflectivity, Semiconducting wafers, Extreme ultraviolet

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Proceedings Article | 26 September 2016 Paper

Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 9985, 99850G (2016) https://doi.org/10.1117/12.2242999

KEYWORDS: Pellicles, Extreme ultraviolet, Optical lithography, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Lead, Lithography, Contamination, Neodymium

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SPIE Journal Paper | 1 August 2016

Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Seong-Wook Kim, Hye-Keun Oh

JM3, Vol. 15, Issue 03, 033504, (August 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.033504

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Reflectivity, Imaging systems, Logic, Semiconductors, Applied physics

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SPIE Journal Paper | 9 May 2016

Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Hye-Keun Oh

JM3, Vol. 15, Issue 02, 023503, (May 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.023503

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Lithography, Optical lithography, Manufacturing, Oxides, 3D modeling

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Proceedings Article | 18 March 2016 Paper

Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9776, 97762P (2016) https://doi.org/10.1117/12.2219874

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Lithographic illumination, Reflectivity, Critical dimension metrology, Lead

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SPIE Journal Paper | 29 January 2016

Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity

In-Seon Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

JM3, Vol. 15, Issue 02, 021003, (January 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021003

KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, EUV optics, Optical lithography, Absorption, Image transmission, Reflectivity

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Proceedings Article | 9 July 2015 Paper

Patterning dependence on the mask defect for extreme ultraviolet lithography

Hye-Rim Ji, In-Seon Kim, Guk-Jin Kim, Jin-Goo Park, Min-Su Kim, Micheal Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9658, 965813 (2015) https://doi.org/10.1117/12.2197751

KEYWORDS: Photomasks, Critical dimension metrology, Particles, Extreme ultraviolet lithography, Mass attenuation coefficient, Optical lithography, Iron, Aluminum, Metals, Extreme ultraviolet

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Proceedings Article | 9 July 2015 Paper

Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity

In-Seon Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9658, 96580K (2015) https://doi.org/10.1117/12.2197752

KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, EUV optics, Absorption, Lead, Image transmission, Distortion

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Proceedings Article | 18 March 2015 Paper

Printing circuits with 4nm feature size: similarities and differences between EUV and optical lithographies

Michael Yeung, Eytan Barouch

Proceedings Volume 9426, 94260R (2015) https://doi.org/10.1117/12.2087322

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Printing, Polarization, Photomasks, Optical lithography, Waveguides, Logic, Semiconducting wafers, Wave propagation

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Proceedings Article | 16 March 2015 Paper

Optical proximity effects in 4-nm EUV lithography: a rigorous study using a new PSTD method

Michael Yeung, Eytan Barouch

Proceedings Volume 9422, 94220V (2015) https://doi.org/10.1117/12.2085943

KEYWORDS: Extreme ultraviolet lithography, Printing, Photomasks, Extreme ultraviolet, Optical proximity correction, Polarization, Waveguides, Device simulation, EUV optics, Fiber optic illuminators

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Proceedings Article | 8 October 2014 Paper

The feasibility of EUV lithography for printing circuits with 4 nm feature size

Michael Yeung, Eytan Barouch

Proceedings Volume 9235, 923514 (2014) https://doi.org/10.1117/12.2069376

KEYWORDS: Photomasks, Extreme ultraviolet, Printing, Extreme ultraviolet lithography, Semiconducting wafers, Near field, Wave propagation, Optical proximity correction, Polarization, Radio propagation

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Proceedings Article | 28 July 2014 Paper

Etched multilayer mask is better than conventional absorber mask

Guk-Jin Kim, Hye-Keun Oh, In-Seon Kim, Michael Yeung, Eytan Barouch

Proceedings Volume 9256, 92560R (2014) https://doi.org/10.1117/12.2069885

KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Semiconducting wafers, Image processing, Ultraviolet radiation, Lithography, Ruthenium, Ions, Oxidation

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Proceedings Article | 28 July 2014 Paper

Etched multilayer mask in EUV lithography for 16 nm node and below

Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9256, 92560Q (2014) https://doi.org/10.1117/12.2069404

KEYWORDS: Photomasks, Computer simulations, Extreme ultraviolet lithography, Diffraction, Lithographic illumination, Image enhancement, Etching, Binary data, Coherence (optics), Extreme ultraviolet

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Proceedings Article | 17 April 2014 Paper

Aerial image of mesh supported extreme ultraviolet pellicle

Ki-ho Ko, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seung-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482D (2014) https://doi.org/10.1117/12.2046202

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Silicon, Thin films, Absorption, Optical simulations, Lithography

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Proceedings Article | 17 April 2014 Paper

193nm inspection of extreme ultraviolet mask absorber defect

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Chang-Moon Lim, Hye-Keun Oh

Proceedings Volume 9048, 90482S (2014) https://doi.org/10.1117/12.2046587

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Extreme ultraviolet lithography, Reflectivity, Defect detection, Antireflective coatings, Multilayers, Oxidation

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Proceedings Article | 17 April 2014 Paper

A study of the effect of pellicle support structures on aerial-image quality in EUV lithography by rigorous electromagnetic simulation

Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9048, 90481U (2014) https://doi.org/10.1117/12.2045618

KEYWORDS: Pellicles, Photomasks, Diffraction, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Projection systems, Transmittance, Electromagnetic simulation, Coherence (optics)

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Proceedings Article | 17 April 2014 Paper

Aerial image deformation caused by various defects of EUV pellicles

Sung-Gyu Lee, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482V (2014) https://doi.org/10.1117/12.2046623

KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Ruthenium, Lithography, Carbon, Computer simulations

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Proceedings Article | 18 March 2014 Paper

Effect of defects on extreme ultraviolet pellicle

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Ji-Won Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482A (2014) https://doi.org/10.1117/12.2046171

KEYWORDS: Pellicles, Contamination, Extreme ultraviolet lithography, Photomasks, Critical dimension metrology, Carbon, Extreme ultraviolet, Lithography, Absorption, Silicon

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Proceedings Article | 28 June 2013 Paper

A very fast and accurate rigorous EMF simulator for EUVL masks based on the pseudo-spectral time-domain method

Michael Yeung, Eytan Barouch

Proceedings Volume 8701, 870113 (2013) https://doi.org/10.1117/12.2027329

KEYWORDS: Finite-difference time-domain method, Extreme ultraviolet lithography, Photomasks, Computer simulations, Reflectivity, Polarization, Diffraction, Mirrors, Interfaces, Lithography

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Proceedings Article | 23 March 2012 Paper

A next-generation EMF simulator for EUV lithography based on the pseudo-spectral time-domain method

Michael Yeung

Proceedings Volume 8322, 83220D (2012) https://doi.org/10.1117/12.916471

KEYWORDS: Finite-difference time-domain method, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Reflectivity, Mirrors, Interfaces, Computer simulations, Multilayers, Lithography

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Proceedings Article | 17 October 2008 Paper

Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography

Michael Yeung

Proceedings Volume 7122, 71221T (2008) https://doi.org/10.1117/12.801351

KEYWORDS: Finite-difference time-domain method, Photomasks, Lithography, Interfaces, Electromagnetism, Computer simulations, Semiconducting wafers, Visualization, Diffraction, Spatial resolution

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SPIE Journal Paper | 1 July 2005

High-frame-rate deep-ultraviolet-optimized charge-coupled device for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high numerical aperture imaging systems

Roderick Kunz, Dennis Rathman, Steven Spector, Michael Rose, Michael Yeung

JM3, Vol. 4, Issue 03, 031105, (July 2005) https://doi.org/10.1117/12.10.1117/1.2032888

KEYWORDS: Polarization, Diodes, Charge-coupled devices, Imaging systems, Photodiodes, Imaging arrays, Photomicroscopy, Silicon, Computer aided design, Silica

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Proceedings Article | 12 May 2005 Paper

A high-frame-rate DUV-optimized CCD for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high NA imaging systems

Roderick Kunz, Dennis Rathman, Steven Spector, Michael Rose, Michael Yeung

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602757

KEYWORDS: Polarization, Charge-coupled devices, Diodes, Imaging systems, Photodiodes, Lithographic illumination, Imaging arrays, Silicon, Computer aided design, Control systems

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SPIE Journal Paper | 1 January 2005

Simulation of the coupled thermal/optical effects for liquid immersion nanolithography

So-Yeon Baek, Alexander Wei, Daniel Cole, Gregory Nellis, Michael Yeung, Amr Abdo, Roxann Engelstad, Mordechai Rothschild, Michael Switkes

JM3, Vol. 4, Issue 01, 013002, (January 2005) https://doi.org/10.1117/12.10.1117/1.1858331

KEYWORDS: Semiconducting wafers, Liquids, Thermal effects, Microfluidics, Wafer-level optics, Refraction, Computational fluid dynamics, Optical lithography, Microfluidic imaging, Photomasks

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Proceedings Article | 28 May 2004 Paper

Simulation of the coupled thermal optical effects for liquid immersion micro-/nano-lithography

So-Yeon Baek, Alexander Wei, Daniel Cole, Greg Nellis, Michael Yeung, Amr Abdo, Roxann Engelstad

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537574

KEYWORDS: Semiconducting wafers, Liquids, Thermal effects, Protactinium, Wafer-level optics, Refraction, Computational fluid dynamics, Microfluidics, Immersion lithography, Microfluidic imaging

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Proceedings Article | 28 May 2004 Paper

Scattering in liquid immersion lithography

Michael Switkes, Theodore Bloomstein, Roderick Kunz, Mordechai Rothschild, J. Ruberti, T. Shedd, Michael Yeung

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534194

KEYWORDS: Liquids, Scattering, Immersion lithography, Rayleigh scattering, Interfaces, Water, Scatter measurement, Raman scattering, Semiconducting wafers, Lithography

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SPIE Journal Paper | 1 January 2004

Simulation study of process latitude for liquid immersion lithography

So-Yeon Baek, Daniel Cole, Mordechai Rothschild, Michael Switkes, Michael Yeung, Eytan Barouch

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637365

KEYWORDS: Liquids, Photoresist materials, Binary data, Immersion lithography, Refraction, Thin films, Printing, Phase shifts, Optical lithography, Projection systems

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Proceedings Article | 26 June 2003 Paper

Fast and rigorous three-dimensional mask diffraction simulation using Battle-Lemarie wavelet-based multiresolution time-domain method

Michael Yeung

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485433

KEYWORDS: Finite-difference time-domain method, Minimum resolvable temperature difference, Diffraction, Wavelets, Photomasks, Optical simulations, Phase shifts, Computer simulations, Numerical analysis, Optical lithography

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Proceedings Article | 26 June 2003 Paper

Simulation study of process latitude for liquid immersion lithography

So-Yeon Baek, Daniel Cole, Mordechai Rothschild, Michael Switkes, Michael Yeung, Eytan Barouch

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.504600

KEYWORDS: Liquids, Binary data, Immersion lithography, Photoresist materials, Photomasks, Refraction, Printing, Optical lithography, Thin films, Projection systems

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Proceedings Article | 26 June 2003 Paper

Monolithic detector array comprised of >1000 aerial image sensing elements

Roderick Kunz, Dennis Rathman, Steven Spector, Michael Yeung

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485414

KEYWORDS: Polarization, Photodiodes, Lithography, Charge-coupled devices, Sensors, Silicon, Diodes, Detector arrays, Diffraction, Electron beam lithography

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Proceedings Article | 22 August 2001 Paper

Electromagnetic scatterometry applied to in-situ metrology

Michael Yeung, Eytan Barouch

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436773

KEYWORDS: Scatterometry, Metrology, Photoresist materials, 3D metrology, Polarization, Electromagnetism, Semiconducting wafers, Algorithm development, In situ metrology, Diffraction

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Proceedings Article | 5 July 2000 Paper

157-nm lithography simulation using a finite-difference time-domain method with oblique incidence in a multilayered medium

Michael Yeung, Eytan Barouch, Clifford Martin, James McClay

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389063

KEYWORDS: Finite-difference time-domain method, Lithography, Photomasks, Multilayers, Chromium, Computer simulations, Interfaces, Dispersion, Electromagnetic scattering, Reflection

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Proceedings Article | 26 July 1999 Paper

Illuminator optimization for projection printing

Eytan Barouch, Steven Knodle, Steven Orszag, Michael Yeung

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354386

KEYWORDS: Fiber optic illuminators, Photomasks, Printing, Phase shifts, Optimization (mathematics), Lithography, Optical proximity correction, Lithographic illumination, Reticles, Image resolution

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Proceedings Article | 26 July 1999 Paper

Application of the hybrid finite-difference time-domain method to modeling curved surfaces in three-dimensional lithography simulation

Michael Yeung, Eytan Barouch

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354316

KEYWORDS: Dielectrics, Finite-difference time-domain method, Image quality standards, Lithography, 3D modeling, Optical spheres, Deep ultraviolet, Plasma, Refractive index, Electromagnetic scattering

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Proceedings Article | 29 June 1998 Paper

Three-dimensional mask transmission simulation using a single integral equation method

Michael Yeung, Eytan Barouch

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310803

KEYWORDS: Dielectrics, Photomasks, Magnetism, Solar thermal energy, Diffraction, Electromagnetic scattering, Phase shifts, Finite-difference time-domain method, Etching, Quartz

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Proceedings Article | 14 August 1997 Paper

Optimization of BARC for nonplanar lithography by three-dimensional electromagnetic simulation

Michael Yeung, Eytan Barouch

Proceedings Volume 3183, (1997) https://doi.org/10.1117/12.280555

KEYWORDS: Lithography, Electromagnetic scattering, Electromagnetic simulation, Scattering, Diffraction, Photomasks, Computer simulations, Superposition

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Proceedings Article | 7 July 1997 Paper

Three-dimensional nonplanar lithography simulation using a periodic fast multipole method

Michael Yeung, Eytan Barouch

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276030

KEYWORDS: Lithography, Electromagnetic scattering, Semiconducting wafers, Fourier transforms, Dielectrics, Reflectivity

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Proceedings Article | 26 May 1995 Paper

Three-dimensional reflective-notching simulation using multipole-accelerated physical optics approximation

Michael Yeung, Andrew Neureuther

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209271

KEYWORDS: Photoresist materials, Reflectivity, Scattering, Magnetism, Multiple scattering, Reflection, Computer simulations, 3D modeling, Electromagnetic scattering, Polarization

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Proceedings Article | 17 May 1994 Paper

Sample-3D benchmarks including high-NA and thin-film effects

John Helmsen, Michael Yeung, Derek Lee, Andrew Neureuther

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175442

KEYWORDS: Photoresist materials, Optical lithography, Thin films, Etching, Photoresist developing, Computer simulations, Plasma etching, Anisotropy, Algorithm development, Ions

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Proceedings Article | 8 August 1993 Paper

Extension of the Hopkins theory of partially coherent imaging to include thin-film interference effects

Michael Yeung, Derek Lee, Robert Lee, Andrew Neureuther

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150443

KEYWORDS: Thin films, Photoresist materials, Diffraction, Optical lithography, Projection systems, Coherence imaging, Wave propagation, Scattering, Spatial filters, Information operations

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Proceedings Article | 8 August 1993 Paper

Improvement of the physical-optics approximation for topography simulation in optical lithography

Michael Yeung, Andrew Neureuther

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150480

KEYWORDS: Multiple scattering, Optical lithography, Wave propagation, Near field diffraction, Diffraction, Photoresist materials, Reflection, Optical simulations, Scattering, Near field optics

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Proceedings Article | 1 January 1992 Paper

Printability of pellicle defects in DUV 0.5-um lithography

Pei-yang Yan, Michael Yeung, Henry Gaw

Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56939

KEYWORDS: Pellicles, Glasses, Photomasks, Modulation transfer functions, Deep ultraviolet, Particles, Lithography, Diffraction, Light sources, Image quality

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Proceedings Article | 1 June 1990 Paper

Photolithography simulation on nonplanar substrates

Michael Yeung

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20196

KEYWORDS: Optical lithography, Scattering, Photoresist materials, Astatine, Lithium, Reflectivity, Photomasks, Light scattering, Numerical integration, Iterative methods

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Showing 5 of 47 publications

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