Michaela Vockenhuber
at Paul Scherrer Institut
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 13 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Semiconductors, Edge detection, Metrology, Detection and tracking algorithms, Image analysis, Scanning electron microscopy, Software development, Extreme ultraviolet, Line width roughness, Semiconducting wafers

Proceedings Article | 4 May 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Optical lithography, Fourier transforms, Electroluminescence, Scanning electron microscopy, Printing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Diffraction gratings

SPIE Journal Paper | 9 November 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Thin films, Zinc, Extreme ultraviolet lithography, Photoresist materials, Metals, FT-IR spectroscopy, Lithography, Absorption, Spectroscopy

Proceedings Article | 9 October 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Diffraction gratings

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Lithography, Light sources, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Diffraction gratings

Showing 5 of 37 publications
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