Michel Habets
at Technische Univ. Eindhoven
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Actuators, Mirrors, Wavefronts, Adaptive optics, Deformable mirrors, Distortion, Thermal effects, Projection systems, Extreme ultraviolet lithography, Optical aberrations, Electroluminescent displays, Thermal modeling

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