Dr. Michiel Kupers
Project Leader at ASML Netherlands BV
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Near infrared, Polishing, Optical lithography, Scanners, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Lithium, Optical lithography, Data modeling, Process control, Semiconductor manufacturing, Semiconducting wafers, Yield improvement, Performance modeling, Overlay metrology, Process modeling

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Metrology, Principal component analysis, Scanners, Time metrology, Semiconductor manufacturing, Immersion lithography, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | September 22, 2011
Proc. SPIE. 8167, Optical Design and Engineering IV
KEYWORDS: Lithography, Light sources, Fabry–Perot interferometers, Optical lithography, Scanners, Laser drilling, Laser stabilization, Extreme ultraviolet, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Chromatic aberrations, Lithography, Metrology, Optical lithography, Laser drilling, Electroluminescence, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Chromatic aberrations, Lithography, Metrology, Laser applications, Distortion, Laser stabilization, Optical simulations, Immersion lithography, Critical dimension metrology, Overlay metrology

Showing 5 of 8 publications
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