Unspecified Michiel Kupers Profile

Michiel Kupers

Project Leader at ASML Netherlands BV

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 9 October 2019 Presentation + Paper

Particle on EUV pellicles, impact on LWR

Michiel Kupers, Gijsbert Rispens, Lokesh Devaraj, Gerardo Bottiglieri, Twan van den Hoogenhoff, Par Broman, Andreas Erdmann, Felix Wahlisch

Proceedings Volume 11147, 111470S (2019) https://doi.org/10.1117/12.2537103

KEYWORDS: Particles, Line width roughness, Pellicles, Semiconducting wafers, Extreme ultraviolet, Reticles, Scanners, Extreme ultraviolet lithography, Photomasks

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Proceedings Article | 29 August 2019 Paper

Lithographic effects due to particles on high-NA EUV mask pellicle

Lokesh Devaraj, Gerardo Bottiglieri, Andreas Erdmann, Felix Wählisch, Michiel Kupers, Eelco van Setten, Timon Fliervoet

Proceedings Volume 11177, 111770V (2019) https://doi.org/10.1117/12.2534177

KEYWORDS: Particles, Pellicles, Photomasks, Phase shifts, Extreme ultraviolet, Scanners, Nanoimprint lithography, Extreme ultraviolet lithography, Reticles

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Proceedings Article | 29 August 2019 Paper

Progress in imaging performance with EUV pellicles

O. Romanets, K. Ricken, M. Kupers, F. Wählisch, C. Piliego, P. Broman, D. de Graaf

Proceedings Volume 11177, 111770Z (2019) https://doi.org/10.1117/12.2535675

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Line width roughness

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SPIE Journal Paper | 17 September 2018

EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction

Joost Bekaert, Peter De Bisschop, Christophe Beral, Eric Hendrickx, Mark A. van de Kerkhof, Sander Bouten, Michiel Kupers, Guido Schiffelers, Erik Verduijn, Timothy A. Brunner

JM3, Vol. 17, Issue 04, 041013, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041013

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet, Stochastic processes, Lithography, Printing, Pellicles, Scanning electron microscopy, Extreme ultraviolet lithography

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Proceedings Article | 21 March 2018 Presentation + Paper

Single exposure EUV of 32nm pitch logic structures: patterning performance on BF and DF masks

V. Blanco Carballo, J. Bekaert, J. H. Franke, R. H. Kim, E. Hendrickx, L. E. Tan, W. Gillijns, Y. Drissi, M. Mao, G. McIntyre, M. Dusa, M. Kupers, D. Rio, G. Schiffelers, E. De Poortere, J. Jia, S. Hsu, M. Demand, K. Nafus, S. Biesemans

Proceedings Volume 10583, 105830L (2018) https://doi.org/10.1117/12.2299639

KEYWORDS: Etching, Tin, SRAF, Optical lithography, Logic, Extreme ultraviolet, Photomasks, Stochastic processes, Scanning electron microscopy, Photoresist processing

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Proceedings Article | 19 March 2018 Presentation + Paper

EUV vote-taking lithography: crazy... or not?

Joost Bekaert, Peter De Bisschop, Christophe Beral, Eric Hendrickx, Mark van de Kerkhof, Sander Bouten, Michiel Kupers, Guido Schiffelers, Erik Verduijn, Timothy Brunner

Proceedings Volume 10583, 105830I (2018) https://doi.org/10.1117/12.2299509

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Stochastic processes, Pellicles, Extreme ultraviolet, Scanning electron microscopy, Inspection, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 24 March 2017 Paper

Experimental verification of on-product overlay improvement by intra-lot overlay control using metrology based grouping

Honggoo Lee, Junghwan Moon, Jaesun Woo, Sangjun Han, Changrock Song, Marc Hauptmann, Weitian Kou, Alexander Ypma, Hyun-Woo Yu, Hank Han, Michiel Kupers, Paul Böcker, Daan Slotboom

Proceedings Volume 10147, 1014713 (2017) https://doi.org/10.1117/12.2259846

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Optical lithography, Scanners, Optical alignment, Near infrared, Polishing

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Proceedings Article | 15 March 2016 Paper

Reduction of wafer-edge overlay errors using advanced correction models, optimized for minimal metrology requirements

Min-Suk Kim, Hwa-Yeon Won, Jong-Mun Jeong, Paul Böcker, Lydia Vergaij-Huizer, Michiel Kupers, Milenko Jovanović, Inez Sochal, Kevin Ryan, Kyu-Tae Sun, Young-Wan Lim, Jin-Moo Byun, Gwang-Gon Kim, Jung-Joon Suh

Proceedings Volume 9780, 97800A (2016) https://doi.org/10.1117/12.2220459

KEYWORDS: Semiconductor manufacturing, Performance modeling, Metrology, Overlay metrology, Lithography, Semiconducting wafers, Process modeling, Optical lithography, Process control, Lithium, Yield improvement, Data modeling

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Proceedings Article | 23 October 2015 Paper

Reduction of in-lot overlay variation with integrated metrology, and a holistic control strategy

Hong-Goo Lee, Sang-Jun Han, Won-Kwang Ma, Young-Sik Kim, Noh-Jung Kwak, Paul Böcker, David Deckers, Weitian Kou, Michiel Kupers, Kevin Ryan, Elliott McNamara, Gwang-Gon Kim, Kyu-Tae Sun, Young-Wan Lim, Jin-Moo Byun, Jung-Joon Suh

Proceedings Volume 9635, 96351S (2015) https://doi.org/10.1117/12.2196879

KEYWORDS: Semiconducting wafers, Metrology, Principal component analysis, Overlay metrology, Optical alignment, Immersion lithography, Time metrology, Scanners, Semiconductor manufacturing, Diffraction

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Proceedings Article | 22 September 2011 Paper

High-range laser bandwidth tuning for focus drilling

Alena Andryzhyieuskaya, John van Keulen, Tom van der Hoeff, Jeroen J. H. Linders, Michiel Kupers, Pablo Gabolde, Bart Smits, Takahito Kumazaki, Satoshi Tanaka, Hiroshi Tanaka, Junichi Fujimoto

Proceedings Volume 8167, 81671X (2011) https://doi.org/10.1117/12.898556

KEYWORDS: Semiconducting wafers, Laser drilling, Lithography, Fabry–Perot interferometers, Overlay metrology, Optical lithography, Extreme ultraviolet, Laser stabilization, Light sources, Scanners

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Proceedings Article | 23 March 2011 Paper

Focus drilling for increased process latitude in high-NA immersion lithography

Ivan Lalovic, Jason Lee, Nakgeuon Seong, Nigel Farrar, Michiel Kupers, Hans van der Laan, Tom van der Hoeff, Carsten Kohler

Proceedings Volume 7973, 797328 (2011) https://doi.org/10.1117/12.882391

KEYWORDS: Laser drilling, Lithography, Metrology, Semiconducting wafers, Electroluminescence, Optical lithography, Immersion lithography, Critical dimension metrology, Photomasks, Chromatic aberrations

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Proceedings Article | 4 March 2010 Paper

Laser bandwidth effect on overlay budget and imaging for the 45 nm and 32nm technology nodes with immersion lithography

Umberto Iessi, Michiel Kupers, Elio De Chiara, Pierluigi Rigolli, Ivan Lalovic, G. Capetti

Proceedings Volume 7640, 76402B (2010) https://doi.org/10.1117/12.846552

KEYWORDS: Laser stabilization, Optical simulations, Overlay metrology, Chromatic aberrations, Laser applications, Lithography, Metrology, Distortion, Immersion lithography, Critical dimension metrology

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Proceedings Article | 24 March 2009 Paper

Scanner matching optimization

Michiel Kupers, Patrick Klingbeil, Joerg Tschischgale, Stefan Buhl, Fritjof Hempel

Proceedings Volume 7272, 72723B (2009) https://doi.org/10.1117/12.813668

KEYWORDS: Scanners, Semiconducting wafers, Overlay metrology, Error analysis, Manufacturing, Switches, Metrology, Feedback loops, Nonlinear control, Extreme ultraviolet lithography

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Proceedings Article | 5 April 2007 Paper

Non-linear methods for overlay control

Michiel Kupers, Dongsub Choi, Boris Habets, Geert Simons, Erik Wallerbos

Proceedings Volume 6518, 65184S (2007) https://doi.org/10.1117/12.713092

KEYWORDS: Semiconducting wafers, Optical alignment, Performance modeling, Overlay metrology, Nonlinear control, Control systems, Process control, Yield improvement, Metrology, Inspection

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Showing 5 of 14 publications

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