Dr. Michiel Kupers
Project Leader at ASML Netherlands BV
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 9 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Reticles, Scanners, Particles, Pellicles, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Reticles, Scanners, Particles, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Phase shifts

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Reflectivity, Pellicles, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography

SPIE Journal Paper | 17 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet, Stochastic processes, Lithography, Printing, Pellicles, Scanning electron microscopy, Extreme ultraviolet lithography

Proceedings Article | 21 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Extreme ultraviolet, SRAF, Photoresist processing, Stochastic processes, Tin

Showing 5 of 14 publications
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