Dr. Michiel Kupers
Project Leader at ASML Netherlands BV
SPIE Involvement:
Author
Publications (11)

SPIE Journal Paper | September 17, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet, Stochastic processes, Lithography, Printing, Pellicles, Scanning electron microscopy, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 21, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Extreme ultraviolet, SRAF, Photoresist processing, Stochastic processes, Tin

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Reticles, Inspection, Scanning electron microscopy, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Near infrared, Polishing, Optical lithography, Scanners, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Lithium, Optical lithography, Data modeling, Process control, Semiconductor manufacturing, Semiconducting wafers, Yield improvement, Performance modeling, Overlay metrology, Process modeling

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Metrology, Principal component analysis, Scanners, Time metrology, Semiconductor manufacturing, Immersion lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 11 publications
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