Dr. Michihiro Shirakawa
at FUJIFILM Corp
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Polymers, Photons, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Contamination, Metals, Chemistry, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Absorption

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Coating, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, High volume manufacturing, Fluorine, Photoresist processing, Semiconducting wafers, Research management, Chemically amplified resists

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Thin films, Lithography, Data modeling, Calibration, Polymers, Image processing, 3D modeling, Computational lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Etching, Polymers, Image processing, Materials processing, Manufacturing, Oxygen, Photomasks, Immersion lithography, High volume manufacturing, Photoresist processing, Semiconducting wafers, Research management, System on a chip

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Optical lithography, Imaging systems, Etching, Coating, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Photoresist processing

Showing 5 of 11 publications
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