We report a compact high-power continuous-wave green laser for a scanning laser projector using one-dimensional
diffractive spatial modulators (GxL modulators). The green laser oscillates in one-dimensional multi-transversal modes
and generates a beam in a line from a periodically-poled stoichiometric lithium tantalate (PPSLT) crystal inside the laser
cavity. The line beam enables diffraction-limited focusing in one direction and can be easily transformed into a top-hat
beam because of the low spatial coherency in the multi-transversal-mode direction. The maximum output green power is
7.2W when pumped at a LD current of 24 A. The input electrical-power efficiency to the green output is as high as 16%
at 6W green power output. We used the laser to build compact, air-cooled laser modules with a cavity footprint as small
as 50 mm2. The laser showed no degradation over 8,500 hours at 3W output.
We report a deep-UV microscope having the best resolution of any optical microscope. The resolution limit is less than 0.1 micron, which is close to the resolution limit of a scanning electron microscope (SEM). Moreover, measurement without vacuum chamber is possible using the new deep-UV microscope. The deep-UV microscope is suitable for inspecting semiconductors, magnetic heads and optical disks.
All-solid-state cw 266 nm laser operates greater than 1000 hours with diffraction-limited beam and low noise output (-130 dB/Hz), which is suitable for next-generation disk mastering.
We describe a 0.4W average power at maximum, frequency-quintupled Q-switched Nd:YAG laser at a repetition rate of 7 kHz, which is a potential light source for next generation microlithography. Calculated results for the conversion efficiencies considering pump depletion will be discussed. Our results allow to foresee further scaling up 213 nm power up to the 1W level by increasing the fundamental power.
High power deep ultraviolet (UV) radiation has attracted much attention in areas such as photo-lithography, micro fabrication, material processing and ultra high density optical disk mastering. We report progress in improving the quality of Czochralski-grown (beta) -BaB2O4 (BBO) which is essential for generating high average output power in the deep ultraviolet regime. We obtained 1.5 W of cw 266 nm output using an external resonant doubler, 1.3 W of 213 nm output from a flashlamp pumped Q-switched Nd:YAG laser and more than 0.4 W of 213 nm radiation from a commercial 6 W diode-pumped high repetition rate Q-switched Nd:YAG laser using our melt-grown BBO crystals for the nonlinear frequency conversion. Using the cw 266 nm output speckle-free 0.25 micrometers photolithography and micro-fabrication was demonstrated.
A new lithography technique using continuous wave (CW) 266 nm radiation from an all solid state frequency quadrupled Nd:YAG laser is described and demonstrated. This laser has proved to be a highly efficient and promising deep UV light source in fabrication of 0.25 micron design rule device. Furthermore, we obtained 0.2 micron L/S pattern with phase shift mask. Speckle free images are obtained with rotating diffuser. The performance and potential of this new laser as a light source of microlithography are discussed and compared with KrF excimer laser theoretically and experimentally.
High power deep ultraviolet (UV) radiation has attracted much attention in areas of photolithography, micro fabrication and material processing as well as ultra high density optical disk mastering. We report progress in quality of (beta) -BaB2O4 (BBO) which is essential in obtaining 1.5 W of cw UV generation from the BBO resonant ring cavity out of 3 W of green input power from a diode pumped Nd:YAG laser. Progress in KTiOPO4 (KTP) and its potential applications are also reviewed.
KEYWORDS: Signal to noise ratio, Semiconductor lasers, Optical discs, Receivers, Interference (communication), Optical storage, High power lasers, Sensors, Laser systems engineering, Polarization
We describe our high-power green laser as a coherent source that is potentially suited to reproduce ultra-high-density optical disks because of its shot-noise-limited characteristics.
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