Dr. Mihir Gupta
at imec
SPIE Involvement:
Profile Summary

Mihir Gupta is a researcher at imec in the Exploratory Patterning Materials group, working on material and metrology research for EUV lithography. He obtained his PhD in Physics from KU Leuven, Belgium in 2021, where he worked on FinFET based electrical sensing of bio-molecules (DNA and proteins). He obtained his master's degree in Microelectronics from Nanyang Technological University (NTU) - Technische Universität München (TUM), Singapore in 2015, and his bachelor's degree in Electronics Engineering from Rajasthan Technical University, India.
Publications (8)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon

Proceedings Article | 9 April 2024 Presentation + Paper
Seonggil Heo, Seungjoo Baek, Mihir Gupta, Hyo Seon Suh, Kodai Kato, Satoshi Takeda, Wataru Shibayama, Rikimaru Sakamoto
Proceedings Volume 12957, 1295710 (2024) https://doi.org/10.1117/12.3011118
KEYWORDS: Semiconducting wafers, Windows, Bridges, Extreme ultraviolet lithography, Photoresist processing, Critical dimension metrology, Photoresist materials, Metal oxides, Image processing, Capillaries

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 124980R (2023) https://doi.org/10.1117/12.2660376
KEYWORDS: Film thickness, Extreme ultraviolet lithography, Etching, Adhesion, Line width roughness, Line edge roughness, Surface roughness, Lithography, Interfaces

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12497, 124970I (2023) https://doi.org/10.1117/12.2657939
KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Extreme ultraviolet lithography, Bridges, Etching

Proceedings Article | 30 April 2023 Presentation
Hyo Seon Suh, Danilo De Simone, Christophe Beral, Mihir Gupta, Nadia Vandenbroeck, Anuja De Silva, Ali Haider, Ching-Chung Huang, Mohand Brouri, Francesco Gullo, Shruti Jambaldinni, Benjamin Kam, Hicham Zaid, Elisseos Verveniotis, Samantha Tan, Tim Weidman, Jengyi Yu, Da Li, Jun Xue, Younghee Lee
Proceedings Volume 12498, 1249803 (2023) https://doi.org/10.1117/12.2661652
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist processing, Materials processing, Interfaces

Showing 5 of 8 publications
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