Mihir Upadhyaya
Process Technology Development Engineer at Intel Corp.
SPIE Involvement:
Author
Area of Expertise:
EUV Lithography , Plasma Dry Etch
Publications (8)

SPIE Journal Paper | 15 May 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Multilayers, Waveguides, Chemical species, Inspection, Computer simulations, Transmission electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Multilayers, Finite-difference time-domain method, Chemical species, Inspection, Atomic force microscopy, Transmission electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Wafer-level optics, Electron beams, Contamination, Scanners, Molecules, Hydrogen, Photoresist materials, Extreme ultraviolet lithography, Semiconducting wafers, Plasma

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Wafer-level optics, Gold, Contamination, Statistical analysis, X-rays, Electrons, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 8 publications
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