Mihir Upadhyaya
Process Technology Development Engineer at Intel Corp.
SPIE Involvement:
Author
Area of Expertise:
EUV Lithography , Plasma Dry Etch
Publications (8)

SPIE Journal Paper | 15 May 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides

Proceedings Article | 16 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Chemical species, Extreme ultraviolet lithography, Inspection, Monte Carlo methods, Computer simulations, Waveguides, Transmission electron microscopy

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Finite-difference time-domain method, Photomasks, Chemical species, Transmission electron microscopy, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Atomic force microscopy, Inspection

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Contamination, Extreme ultraviolet lithography, Semiconducting wafers, Photoresist materials, Hydrogen, Scanners, Molecules, Plasma, Wafer-level optics, Electron beams

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Electrons, X-rays, Extreme ultraviolet lithography, Extreme ultraviolet, Contamination, Semiconducting wafers, Wafer-level optics, Gold, Reflectivity, Statistical analysis

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Reflectivity, Extreme ultraviolet, Photomasks, Etching, Ruthenium, Multilayers, Surface roughness, Particles, Mask cleaning, Oxidation

Showing 5 of 8 publications
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