Mika Pflüger
PhD Student at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Author
Area of Expertise:
GISAXS
Websites:
Publications (3)

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Semiconductors, Metrology, Scattering, X-rays, Laser scattering, Time metrology, Grazing incidence, Semiconducting wafers, Scatter measurement, Absorption

Proceedings Article | 26 June 2017
Proc. SPIE. 10330, Modeling Aspects in Optical Metrology VI
KEYWORDS: Optical components, Nanostructures, Diffractive optical elements, Scattering, Scatterometry, Extreme ultraviolet, Line width roughness, Line edge roughness, Electronic circuits, Prototyping, Edge roughness, Diffraction gratings

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Metrology, Scattering, X-rays, Laser scattering, Scatterometry, Monte Carlo methods, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Grazing incidence, X-ray characterization, Diffraction gratings

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