Mike Garrett
Central Mask Integration Manager at Micron Technology Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Semiconductors, Reticles, Air contamination, Scanners, Manufacturing, Inspection, Pellicles, Wafer inspection, Photomasks, Semiconducting wafers

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Lithography, Metrology, Imaging systems, Scanners, Inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Yield improvement

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