Mr. Mike Kubenz
at micro resist technology GmbH
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 22, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Etching, Polymers, Ultraviolet radiation, Coating, Resistance, Epoxies, Nanoimprint lithography, Semiconducting wafers, Temperature metrology

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Polymers, Glasses, Ultraviolet radiation, Annealing, Polymerization, Epoxies, Nanoimprint lithography, Photoresist processing, Temperature metrology

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Polymethylmethacrylate, Polymers, Glasses, Annealing, Distortion, Solids, Polymerization, Nanoimprint lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Optical lithography, Ultraviolet radiation, Silicon, Coating, Photoresist materials, Infrared radiation, Photomasks, Photoresist processing, Semiconducting wafers

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