Dr. Mike Pochkowski
Director of Sales
SPIE Involvement:
Publications (10)

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63490K (2006) https://doi.org/10.1117/12.686741
KEYWORDS: Pellicles, Optical proximity correction, Apodization, Polarization, Critical dimension metrology, Lithography, Photomasks, Semiconducting wafers, Reticles, Spatial frequencies

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.593125
KEYWORDS: Photomasks, Manufacturing, Calibration, Optical proximity correction, Lithography, Yield improvement, Artificial intelligence, Design for manufacturability, Design for manufacturing, Photoresist processing

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474499
KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Metrology, Reticles, Finite element methods, Data modeling, Lithography, 3D image processing

Proceedings Article | 22 August 2001 Paper
Chris Mack, Sven Jug, Rob Jones, Prasad Apte, Scott Williams, Mike Pochkowski
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436763
KEYWORDS: Scanning electron microscopy, Image processing, Edge detection, Shape analysis, Lithography, Line edge roughness, Semiconducting wafers, Metrology, Etching, Reticles

Proceedings Article | 22 August 2001 Paper
John Allgair, Michelle Ivy, Kevin Lucas, John Sturtevant, Richard Elliott, Chris Mack, Craig MacNaughton, John Miller, Mike Pochkowski, Moshe Preil, John Robinson, Frank Santos
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436743
KEYWORDS: Optical proximity correction, Reticles, Photomasks, Lithography, Scanning electron microscopy, Critical dimension metrology, Etching, Semiconducting wafers, Tolerancing, Optical lithography

Showing 5 of 10 publications
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