Dr. Mike Pochkowski
Director of Sales
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Apodization, Reticles, Polarization, Spatial frequencies, Pellicles, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Calibration, Manufacturing, Design for manufacturing, Photomasks, Artificial intelligence, Optical proximity correction, Photoresist processing, Yield improvement, Design for manufacturability

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Reticles, Metrology, Data modeling, Scanning electron microscopy, Finite element methods, Photomasks, Optical proximity correction, Semiconducting wafers, 3D image processing

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Lithography, Reticles, Etching, Scanning electron microscopy, Photomasks, Shape analysis, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Lithography, Reticles, Edge detection, Metrology, Etching, Image processing, Scanning electron microscopy, Shape analysis, Line edge roughness, Semiconducting wafers

Showing 5 of 10 publications
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