Mikio Ishikawa
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | April 22, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Electron beams, Sensors, Quartz, Silicon, Image resolution, Photomasks, Semiconducting wafers, Signal detection, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Thin films, Etching, Quartz, Ultraviolet radiation, Silicon, Photomasks, Nanoimprint lithography, Photoresist processing, Beam propagation method, Chemically amplified resists

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Semiconductors, Metrology, Etching, Quartz, Manufacturing, Printing, Nanoimprint lithography, Reactive ion etching, Semiconducting wafers, Beam propagation method

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Electron beam lithography, Ultraviolet radiation, Silicon, Scanning electron microscopy, Nanoimprint lithography, Head-mounted displays, Line edge roughness, Photoresist processing, Adhesives, Chemically amplified resists

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Fabrication, Quartz, Chromium, Scanning electron microscopy, Photomasks, Double patterning technology, Nanoimprint lithography, Optical alignment, Neodymium, Nanolithography

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Silicon, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers, Charged-particle lithography, Holons

Showing 5 of 10 publications
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