Milton C. Godwin
at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Multilayers, Silica, Ions, Inspection, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Failure analysis, Ruthenium

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Statistical analysis, Defect detection, Particles, Crystals, Inspection, Reflectivity, Scanning electron microscopy, Extreme ultraviolet, Signal detection, Failure analysis

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Defect detection, Phase modulation, Silica, Quartz, Particles, Calcium, Inspection, Photomasks, Extreme ultraviolet, Defect inspection

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Polishing, Silica, Glasses, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Particles, Ions, Reflectivity, Dielectrophoresis, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Yield improvement

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Chemical species, Particles, Ions, Silicon, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Ruthenium

Showing 5 of 7 publications
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