Miss Min Bai
Senior R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Mathematical modeling, Lithography, Data modeling, Polarization, Silicon, Photomasks, Immersion lithography, Optical proximity correction, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Thin films, Lithography, Light sources, Lithographic illumination, Polarization, Fourier transforms, Photomasks, Space operations, Semiconducting wafers, Light

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Thin films, Lithography, Polarization, Magnetism, Photomasks, Immersion lithography, Optical proximity correction, Semiconducting wafers, Light wave propagation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Reticles, Data modeling, Calibration, 3D modeling, 3D metrology, Transmittance, Photomasks, Optical proximity correction, Phase shifts

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Thin films, Lithography, Light sources, Optical lithography, Lithographic illumination, Polarization, Fourier transforms, Photomasks, Semiconducting wafers, Light

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Wafer-level optics, Thin films, Optical lithography, Polarization, Reflection, Computer simulations, Immersion lithography, Optical proximity correction, Semiconducting wafers, Process modeling

Showing 5 of 7 publications
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