MingTe Lee
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Photomasks, Optical proximity correction

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Manufacturing, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Edge roughness, Holons

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