Dr. Mingqi Li
Technical laureate at DuPont Electronics & Industrial
SPIE Involvement:
Area of Expertise:
photolithographic materials , liquid crystalline polymers , photoresist , block copolymer , self-assembly , polymer chemistry
Profile Summary

Mingqi Li is a technical laureate at DuPont Electronics and Industrial, located at Marlborough, Massachusetts. He received his BS and MS degrees from Tsinghua University, China, and a PhD degree from Cornell University. His
research interests include various spin on solutions for photolithographic materials, block copolymers, and liquid crystalline materials. He is an inventor of over 50 granted US patents, and an author of over 40 journal and technical papers. His achievements were recognized with the Asian American Engineering of the Year (AAEOY) Award in 2019, and DuPont’s Pedersen medal in 2021.
Publications (21)

Proceedings Article | 9 April 2024 Paper
P. LaBeaume, K. Hernandez, E. Vitaku, T. Marangoni, E. Aqad, M. Li, C. Hoelzel, J. Lachowski, M. Hayes, S. Wong, J. Li, A. Kwok, W. Huang, J. Park, H. He, H. Mackay, C. Liu, J. Cameron, C. Xu, Q. Xie, K. Petrillo
Proceedings Volume 12957, 129572B (2024) https://doi.org/10.1117/12.3025297
KEYWORDS: Photoacid generators, Photoresist materials, Semiconducting wafers, Design, Lithography, Optical lithography, Coating thickness, Chemistry, Coating, Silicon, Sustainability, Extreme ultraviolet lithography

Proceedings Article | 30 April 2023 Presentation
Mingqi Li, Emad Aqad, Tomas Marangoni, James Cameron, Paul LaBeaume, Jung-June Lee, Jae-Hwan Sim, Choong Bong Lee, Xisen Hou, Michael Eller, Stanislav Verkhorurov, Emile Schweikert, Peter Trefonas, Chengbai Xu
Proceedings Volume 12498, 124980H (2023) https://doi.org/10.1117/12.2657445
KEYWORDS: Optical lithography, Thin films, Semiconductors, Semiconductor manufacturing, Photoresist materials, Manufacturing, Lithography

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Joshua Kaitz, Mingqi Li, Ryan Lee, Amy Kwok, Thomas Cardolaccia, Amiel Evans, Choong-Bong Lee, Xisen Hou, Ke Yang
Proceedings Volume 11612, 116120U (2021) https://doi.org/10.1117/12.2583735
KEYWORDS: Polymers, Semiconducting wafers, Lithography, Water, Photoresist materials, Immersion lithography, Coating, 193nm lithography, Surface properties, Semiconductor manufacturing, Polymer chemistry

Proceedings Article | 23 March 2020 Presentation + Paper
Yang Song, Mingqi Li, Jong Park, Xisen Hou, Yusuke Matsuda, Cong Liu, Emad Aqad, Janet Wu, Huan He, Huiying Liu, Paul Baranowski, Cheng Bai Xu
Proceedings Volume 11326, 113260N (2020) https://doi.org/10.1117/12.2552140
KEYWORDS: Photoresist materials, Polymers, Absorbance, Coating, Photoresist developing, 3D applications, Transparency, Transmittance, Molecules, Lithography

Proceedings Article | 20 March 2020 Paper
Michael Eller, Mingqi Li, Xisen Hou, Stanislav Verkhoturov, Emile Schweikert, Peter Trefonas
Proceedings Volume 11325, 113252N (2020) https://doi.org/10.1117/12.2551941
KEYWORDS: Ions, Photoresist materials, Gold, Molecules, Photoresist developing, Molecular electronics, Mass spectrometry, Nanoparticles, Silicon, Antireflective coatings

Showing 5 of 21 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top