Dr. Mingqi Li
Principle Research Scientist at Dow Electronic Materials
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 23, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Scanning electron microscopy, Line width roughness

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Coating, Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Photoresist technology, Photoresist developing, Defect inspection

PROCEEDINGS ARTICLE | May 25, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithium, Optical lithography, Etching, Coating, Manufacturing, Photomasks, Integrated circuits, Double patterning technology, Immersion lithography, Deposition processes

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Cadmium, Materials processing, Scanning electron microscopy, Printing, Photoresist materials, Line width roughness, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Photoresist developing, 193nm lithography

PROCEEDINGS ARTICLE | March 27, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Cadmium, Etching, Polymers, Glasses, Silicon, Scanning electron microscopy, Line width roughness, Directed self assembly, Reactive ion etching

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Etching, Dry etching, Polymers, Metals, Silicon, Reflectivity, Chemical vapor deposition, Oxygen, Photoresist materials, Photomasks

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top