Dr. Mingxing Wang
at Univ of North Carolina at Charlotte
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Deep ultraviolet, Polymers, Matrices, Molecules, Photoresist materials, Ionization, Picosecond phenomena, Photolysis, Polymer thin films, Absorption

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Refractive index, Nanoparticles, Polymers, Metals, Particles, Zinc, Immersion lithography, Nanocomposites, Lead

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Silicon, Scanning electron microscopy, NOx, Extreme ultraviolet lithography, Line edge roughness, Polymer thin films, Absorption

Proceedings Article | 23 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Etching, Polymers, Resistance, Photoresist materials, Polymerization, Line edge roughness, Fluorine, Semiconducting wafers

Proceedings Article | 23 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Polymers, Image processing, Photoresist materials, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

Showing 5 of 8 publications
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