Dr. Mingxing Wang
at Univ of North Carolina at Charlotte
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Deep ultraviolet, Polymers, Matrices, Molecules, Photoresist materials, Ionization, Picosecond phenomena, Photolysis, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Refractive index, Nanoparticles, Polymers, Metals, Particles, Zinc, Immersion lithography, Nanocomposites, Lead

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Silicon, Scanning electron microscopy, NOx, Extreme ultraviolet lithography, Line edge roughness, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Etching, Polymers, Resistance, Photoresist materials, Polymerization, Line edge roughness, Fluorine, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Polymers, Image processing, Photoresist materials, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Silicon, Diffusion, Image resolution, Photoresist materials, Line edge roughness, Analog electronics, Semiconducting wafers, Polymer thin films

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top