Minoru Kitada
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Metrology, Data modeling, Silicon, Distortion, Printing, Photomasks, Mask making, Semiconducting wafers, Data corrections

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Metrology, Error analysis, Silicon, Distortion, Image analysis, Photomasks, Electron beam direct write lithography, Semiconducting wafers, Charged-particle lithography

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Oxides, Electron beam lithography, Etching, Silicon, Doping, Optical testing, Photomasks, Semiconducting wafers, Projection lithography, Charged-particle lithography

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