Minoru Kitada
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Metrology, Data modeling, Silicon, Distortion, Printing, Photomasks, Mask making, Semiconducting wafers, Data corrections

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Metrology, Error analysis, Silicon, Distortion, Image analysis, Photomasks, Electron beam direct write lithography, Semiconducting wafers, Charged-particle lithography

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Oxides, Electron beam lithography, Etching, Silicon, Doping, Optical testing, Photomasks, Semiconducting wafers, Projection lithography, Charged-particle lithography

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top