Dr. Minoru Sugawara
Senior Researcher at Sony Semiconductor Manufacturing Corp
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Wafer-level optics, Metrology, Logic, Cadmium, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Personal protective equipment, Near field optics

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Data modeling, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Source mask optimization, Computational lithography, Optical proximity correction

Proceedings Article | 15 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Monochromatic aberrations, Reflectivity, Electroluminescence, Photomasks, Extreme ultraviolet, Cadmium sulfide, Extreme ultraviolet lithography, Tantalum, Semiconducting wafers, Tolerancing

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Electron beam lithography, Polishing, Metrology, Particles, Inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Wafer-level optics, Cadmium, Reflection, Reflectivity, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Tantalum, Semiconducting wafers, Light

Showing 5 of 31 publications
Conference Committee Involvement (4)
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XI
14 April 2004 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
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