Dr. Minoru Toriumi
at Tokyo Univ. of Science
SPIE Involvement:
Conference Program Committee | Author
Profile Summary

Minoru Toriumi received his ph. D. in Chemistry from Tokyo Institute of Technology in 1984. He has studied the photoresists materials at Hitachi Central Research Laboratory, Daikin Industries, Ltd. and Osaka University. He presides over Laboratory for Interdisciplinary Science and Technology to study resist materials and applications of the free electron laser at Tokyo University of Science.
Publications (28)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Mid-IR, Polymers, Silicon, Chemistry, Laser ablation, Chemical analysis, Free electron lasers, Absorption

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Metals, Infrared lasers, Infrared radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Scientific research, Photoresist processing, Free electron lasers, Photoresist developing

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Oxides, Lithography, Light sources, FT-IR spectroscopy, Chemical species, Metals, Molecules, X-rays, X-ray diffraction, Extreme ultraviolet, Extreme ultraviolet lithography, Photoemission spectroscopy, Zirconium, Free electron lasers, Scanning transmission electron microscopy

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Polymers, Ions, Diffusion, Computer simulations, 3D modeling, Solids, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Chemical species, Polymers, Molecules, Sulfur, Oxygen, Extreme ultraviolet, Extreme ultraviolet lithography, Molecular interactions, Line edge roughness, Fluorine

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Scattering, Molecules, Ions, Monte Carlo methods, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Product distribution

Showing 5 of 28 publications
Conference Committee Involvement (2)
Advances in Resist Materials and Processing Technology XXIII
20 February 2006 | San Jose, California, United States
Advances in Resist Technology and Processing XXI
23 February 2004 | Santa Clara, California, United States
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