Minoru Toriumi received his ph. D. in Chemistry from Tokyo Institute of Technology in 1984. He has studied the photoresists materials at Hitachi Central Research Laboratory, Daikin Industries, Ltd. and Osaka University. He presides over Laboratory for Interdisciplinary Science and Technology to study resist materials and applications of the free electron laser at Tokyo University of Science.
Inhomogeneity of PAGs in a hybrid-type EUV resist system studied by molecular-dynamics simulations for EUV lithography
Dissolution characteristics of resist polymers studied by quartz crystal microbalance transmission-line analysis and pKa acidity analysis
Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics