Since EUV pellicle is very thin, It can be affected easily on its manufacturing process or the exposure process. The Pellicle has several types of stress, above all the pellicle has a residual stress from its manufacturing process. To determine the effect of residual stress on the pellicle, we calculated residual stress of several types of multi-layer pellicle by using formula. We could confirm that the residual stress has non-negligible values through the calculation results, and we obtained the thermal stress of each pellicle by using finite element method (FEM). we optimized the pellicle through comparison of total stress by plus the calculated residual stress and the thermal stress. As a result, since the p-Si core pellicle with B<sub>4</sub>C capping satisfies both high transparent and low total stress, we chose p-Si core pellicle with B<sub>4</sub>C capping as a suitable pellicle.