Dr. Miroslav Cupak
at imec
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 27 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Optical lithography, Fin field effect transistors, Metals, Silicon, Process control, Extreme ultraviolet, Line edge roughness, Computer architecture, Standards development

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