Dr. Mitsuaki Amemiya
at Canon Inc
SPIE Involvement:
Publications (13)

SPIE Journal Paper | 27 February 2012
JM3, Vol. 11, Issue 1, 013002, (February 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013002
KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters

Proceedings Article | 8 April 2011 Paper
Kazuya Ota, Masami Yonekawa, Mitsuaki Amemiya, Takao Taguchi, Osamu Suga
Proceedings Volume 7969, 79691V (2011) https://doi.org/10.1117/12.879553
KEYWORDS: Reticles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Electrodes, Photomasks, Particle contamination, Resistance, Dielectric polarization

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013002, (January 2011) https://doi.org/10.1117/12.10.1117/1.3532835
KEYWORDS: Photomasks, Particles, Extreme ultraviolet lithography, Dielectrics, Electrodes, Quartz, Resistance, Dielectric polarization, Solids, Inspection

Proceedings Article | 27 May 2010 Paper
Proceedings Volume 7748, 77481B (2010) https://doi.org/10.1117/12.867929
KEYWORDS: Particles, Inspection, Signal detection, Photomasks, Error analysis, Extreme ultraviolet lithography, Strontium, Nickel, Laser scattering, Scattering

Proceedings Article | 18 March 2009 Paper
Kazuya Ota, Takao Taguchi, Mitsuaki Amemiya, Naosuke Nishimura, Osamu Suga
Proceedings Volume 7271, 72713M (2009) https://doi.org/10.1117/12.812952
KEYWORDS: Particles, Reticles, Optical spheres, Carbon, Extreme ultraviolet, Silicon carbide, Interferometers, Quartz, Photovoltaics, Extreme ultraviolet lithography

Showing 5 of 13 publications
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