Dr. Mitsuaki Amemiya
at Canon Inc
SPIE Involvement:
Author
Publications (13)

SPIE Journal Paper | February 27, 2012
JM3 Vol. 11 Issue 1
KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Electrodes, Particles, Resistance, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Dielectric polarization

SPIE Journal Paper | January 1, 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Photomasks, Particles, Extreme ultraviolet lithography, Dielectrics, Electrodes, Quartz, Resistance, Dielectric polarization, Solids, Inspection

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Scattering, Particles, Error analysis, Nickel, Inspection, Laser scattering, Photomasks, Extreme ultraviolet lithography, Signal detection, Strontium

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Carbon, Photovoltaics, Reticles, Optical spheres, Interferometers, Quartz, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Defect detection, Quartz, Electrodes, Particles, Resistance, Inspection, Latex, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 13 publications
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