Mitsuhiro Kureishi
at HOYA Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Multilayers, Etching, Dry etching, Silicon, Reflectivity, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet

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