Prof. Mitsuru Ueda
at Tokyo Institute of Technology
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Refractive index, Polymers, Water, Sulfur, Chemistry, Imaging spectroscopy, Absorbance, Immersion lithography, Chlorine, Absorption

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Electron beams, Etching, Polymers, Ions, Silicon, Inspection, Scanning electron microscopy, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Transparency, Magnesium, Polymers, Spectroscopy, Infrared spectroscopy, Photoresist materials, Polymerization, Chlorine, Vacuum ultraviolet, Chemically amplified resists

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