Mitsuyo Kariya
at Toshiba Corp
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Error analysis, Inspection, Feature extraction, Scanning electron microscopy, Photomasks, Mask making, Computer aided design, Quality systems, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Infrared imaging, Lithography, Lithographic illumination, Scanners, Reliability, Inspection, Data acquisition, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Thin films, Lithography, Data modeling, Calibration, Image quality, Transmittance, Photomasks, Photoresist processing, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Manufacturing, Reliability, Photomasks, Critical dimension metrology, Virtual reality, Semiconducting wafers

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Lithium, Calibration, Distortion, Scanning electron microscopy, Image quality, Photomasks, Image enhancement, Optical proximity correction, Computer aided design

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Image processing, Reliability, Scanning electron microscopy, Image quality, Photomasks, Computer aided design, Critical dimension metrology, Semiconducting wafers

Showing 5 of 9 publications
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