Dr. Mohamed S. Bahnas
Application Engineer Consultat at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Cadmium, Visualization, Databases, Design for manufacturing, Photomasks, Semiconductor manufacturing, Computational lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Photovoltaics, Optical lithography, Aerospace engineering, Visualization, Databases, Metals, Manufacturing, Legal, Optical proximity correction, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Signal attenuation, Image processing, Silicon, Manufacturing, Computer simulations, Photomasks, Optical simulations, Optical proximity correction, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Mathematical modeling, Data modeling, Calibration, Image processing, Computer simulations, Optical proximity correction, Semiconducting wafers, Statistical modeling, Systems modeling, Process modeling

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Visualization, Manufacturing, Printing, Photomasks, Optical proximity correction, Feedback loops, Neodymium, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Photovoltaics, Image processing, Error analysis, Printing, SRAF, Critical dimension metrology, Semiconducting wafers, Antimony, Tolerancing, Model-based design

Showing 5 of 9 publications
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