Dr. Mohamed S. Bahnas
Product Marketing Manager at ASML Silicon Valley
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Cadmium, Visualization, Databases, Design for manufacturing, Photomasks, Semiconductor manufacturing, Computational lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Photovoltaics, Optical lithography, Aerospace engineering, Visualization, Databases, Metals, Manufacturing, Legal, Optical proximity correction, Resolution enhancement technologies

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Signal attenuation, Image processing, Silicon, Manufacturing, Computer simulations, Photomasks, Optical simulations, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Mathematical modeling, Data modeling, Calibration, Image processing, Computer simulations, Optical proximity correction, Semiconducting wafers, Statistical modeling, Systems modeling, Process modeling

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Visualization, Manufacturing, Printing, Photomasks, Optical proximity correction, Feedback loops, Neodymium, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 9 publications
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