Mohamed Gheith
RET Consulting Manager at Mentor Graphics Egypt
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Logic, Visualization, Metals, Manufacturing, Photomasks, Shape analysis, Double patterning technology, Optical proximity correction, Resolution enhancement technologies

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical lithography, Visualization, Image processing, Computer simulations, Distance measurement, Bridges, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers

Proceedings Article | 4 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Defect detection, Inspection, Printing, Monte Carlo methods, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Mathematical modeling, Data modeling, Calibration, Image processing, Computer simulations, Scanning electron microscopy, Quantization, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 21 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Neck, Lithography, Visualization, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Standards development, Defect inspection

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top