Dr. Mohamed Saib
at ASELTA Nanographics
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 26 September 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Switches, Data modeling, Calibration, Electroluminescence, Chemical analysis, Optimization (mathematics), Statistical modeling

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Metrology, Logic, Optical lithography, Data modeling, Calibration, Manufacturing, Electroluminescence, Software development, Optical simulations, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Electronic design automation

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photovoltaics, Point spread functions, Electron beams, Scattering, Calibration, Computer simulations, Cadmium sulfide, Critical dimension metrology, Algorithm development, Semiconducting wafers

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Data modeling, Calibration, Data processing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Process modeling

Proceedings Article | 23 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Electron beam lithography, Point spread functions, Metrology, Data modeling, Opacity, Calibration, Error analysis, Semiconducting wafers, Statistical modeling, Process modeling

Showing 5 of 9 publications
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