Mohamed Salama
Pr. Field Application Engineer
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Tolerancing, Stochastic processes, Back end of line, Design for manufacturability

Proceedings Article | 23 March 2016 Paper
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Semiconductors, Lithography, Photovoltaics, Optical lithography, Lithographic illumination, Etching, Manufacturing, Printing, Photomasks, Line width roughness, Double patterning technology, Logic devices, Optical proximity correction, SRAF, Analog electronics, Design for manufacturability

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Calibration, Etching, Computer simulations, Bridges, Photomasks, Optical proximity correction, Semiconducting wafers, Yield improvement

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Optical lithography, Data modeling, Calibration, Etching, Metals, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

Proceedings Article | 16 September 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Optical lithography, Etching, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Chemical mechanical planarization

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