Dr. Mohamed Talbi
at IBM Corp
SPIE Involvement:
Publications (7)

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Photomasks, Data modeling, Calibration, 3D modeling, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Process modeling, Silicon

Proceedings Article | 3 April 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: 3D modeling, Critical dimension metrology, Data modeling, Process modeling, Scanning electron microscopy, Semiconducting wafers, Etching, Optical lithography, Printing, 3D image processing

Proceedings Article | 13 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: 3D modeling, Photoresist materials, Data modeling, Calibration, Scanning electron microscopy, Critical dimension metrology, Photomasks, 3D image processing, Statistical modeling, Optical lithography

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Optical proximity correction, Metrology, Data modeling, Pattern recognition, Semiconducting wafers, Reticles, Time metrology, Target recognition, Optical lithography, Quality measurement

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical proximity correction, Data modeling, Performance modeling, Diffusion, Optics manufacturing, Scanning electron microscopy, Model-based design, Calibration, Apodization, Optical lithography

Showing 5 of 7 publications
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