Dr. Mohamed Talbi
at IBM Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Data modeling, Calibration, Silicon, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Process modeling

Proceedings Article | 3 April 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Optical lithography, Data modeling, Etching, 3D modeling, Scanning electron microscopy, Printing, Critical dimension metrology, Semiconducting wafers, Process modeling, 3D image processing

Proceedings Article | 13 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical lithography, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photoresist materials, Photomasks, Critical dimension metrology, Statistical modeling, 3D image processing

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Optical lithography, Data modeling, Pattern recognition, Quality measurement, Time metrology, Optical proximity correction, Target recognition, Semiconducting wafers

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Apodization, Optical lithography, Data modeling, Calibration, Diffusion, Scanning electron microscopy, Optical proximity correction, Optics manufacturing, Performance modeling, Model-based design

Showing 5 of 7 publications
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