Dr. Mohan Ananth
Sr. Director, Strategic and Government Programs at Carl Zeiss Microscopy LLC
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 1 June 2011 Paper
Proc. SPIE. 8036, Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
KEYWORDS: Gold, Chemical species, Sputter deposition, Ions, Image resolution, Scanning electron microscopy, Scanning helium ion microscopy, Ion beams, Helium, Gallium

Proceedings Article | 22 January 2001 Paper
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Carbon, Reticles, Contamination, Quartz, Molecules, Inspection, Scanning electron microscopy, Photomasks, Semiconducting wafers, Binary data

Proceedings Article | 25 August 1999 Paper
Proc. SPIE. 3748, Photomask and X-Ray Mask Technology VI
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Databases, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 14 June 1999 Paper
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Wafer-level optics, Reticles, Manufacturing, Inspection, 3D modeling, Scanning electron microscopy, Optical inspection, Photomasks, Cadmium sulfide, Semiconducting wafers

Proceedings Article | 12 February 1997 Paper
Proc. SPIE. 3236, 17th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Reticles, Metrology, Quartz, Glasses, Silicon, Scanning electron microscopy, Photoresist materials, Photomasks, Critical dimension metrology, Semiconducting wafers

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