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Dr. Mohan Bhan
Vice President at Optical Associates Inc
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Publications (1)
Proceedings Article | 3 September 1999 Paper
Characterization of PECVD Ti process and development of a plasma-less chlorine clean for process repeatability in advanced DRAM manufacturing
Mohan Bhan, Fred Wu, R. Srinivas, Brian Metzger, Zvi Lando, Murali Narasimhan, Fusen Chen
Proceedings Volume 3882, (1999) https://doi.org/10.1117/12.361307
KEYWORDS: Semiconducting wafers, Titanium, Plasma enhanced chemical vapor deposition, Chlorine, Particles, Manufacturing, Reliability, Deposition processes, Plasma, Resistance
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