Dr. Moitreyee Mukherjee-Roy
Member of Technical Staff at Grace Semiconductor Manufacturing Corp
SPIE Involvement:
Author
Publications (12)

SPIE Journal Paper | 1 April 2005
JM3 Vol. 4 Issue 02
KEYWORDS: Photomasks, Phase shifts, Monochromatic aberrations, Reticles, Diffraction, Critical dimension metrology, Cadmium, Scattering, Optical lithography, Semiconducting wafers

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Modulation, Etching, Scanners, Manufacturing, Scanning electron microscopy, Photomasks, Binary data, Phase shifts

Proceedings Article | 24 May 2004 Paper
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Monochromatic aberrations, Reticles, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Mask making, Structural design, Overlay metrology, Phase shifts

Proceedings Article | 3 May 2004 Paper
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Electron beam lithography, Reticles, Optical lithography, Scanners, Scanning electron microscopy, Directed energy weapons, Photomasks, Field effect transistors, Semiconducting wafers

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Diffraction, Reticles, Optical lithography, Modulation, Scattering, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts

Showing 5 of 12 publications
Conference Committee Involvement (3)
Metrology, Inspection, and Process Control for Microlithography XX
20 February 2006 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XIX
28 February 2005 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XVIII
23 February 2004 | Santa Clara, California, United States
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