Dr. Monica Kempsell Sears
Senior Product Engineer at Siemens AG
SPIE Involvement:
Publications (11)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 124950A (2023) https://doi.org/10.1117/12.2660413
KEYWORDS: Photomasks, Extreme ultraviolet, Source mask optimization, Resolution enhancement technologies, Optical proximity correction, Lithography, Optical lithography, Capacitors, Semiconducting wafers, SRAF

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 124941C (2023) https://doi.org/10.1117/12.2657767
KEYWORDS: SRAF, Printing, Extreme ultraviolet, Deep ultraviolet, Image quality, Lithography

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 86830G (2013) https://doi.org/10.1117/12.2010034
KEYWORDS: Photomasks, Wavefronts, Monochromatic aberrations, Spherical lenses, Diffraction, Nanolithography, Data modeling, Lithography, Neodymium, Semiconducting wafers

SPIE Journal Paper | 6 February 2013
JM3, Vol. 12, Issue 01, 013008, (February 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.1.013008
KEYWORDS: Spherical lenses, Monochromatic aberrations, Diffraction, Finite element methods, Photomasks, Wavefronts, Nanolithography, Lithography, Error analysis, Silicon

Proceedings Article | 13 March 2012 Paper
Proceedings Volume 8326, 832611 (2012) https://doi.org/10.1117/12.917440
KEYWORDS: Photomasks, Monochromatic aberrations, Spherical lenses, Finite element methods, Wavefronts, Diffraction, Binary data, Lithography, Phase shifts, Scanners

Showing 5 of 11 publications
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