Dr. Monica Kempsell Sears
RET Engineer at Intel Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Monochromatic aberrations, Data modeling, Wavefronts, Photomasks, Neodymium, Spherical lenses, Semiconducting wafers, Nanolithography

SPIE Journal Paper | 6 February 2013
JM3 Vol. 12 Issue 01
KEYWORDS: Spherical lenses, Monochromatic aberrations, Diffraction, Finite element methods, Photomasks, Wavefronts, Nanolithography, Lithography, Error analysis, Silicon

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Diffraction, Monochromatic aberrations, Scanners, Wavefronts, Finite element methods, Photomasks, Spherical lenses, Binary data, Phase shifts

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Semiconductors, Lithography, Diffraction, Monochromatic aberrations, Wavefronts, Finite element methods, Photomasks, Source mask optimization, Spherical lenses, Binary data

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Photomasks, Atrial fibrillation, Image quality, Photovoltaics, Lithography, Optical proximity correction, Semiconducting wafers, Phase shifts, Model-based design, Lithographic illumination

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Reticles, Optical lithography, Manufacturing, Electroluminescence, Printing, Photomasks, Source mask optimization, SRAF, Semiconducting wafers

Showing 5 of 9 publications
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