Dr. Monique Ercken
Program Manager Advanced Patterning at imec
SPIE Involvement:
Author
Publications (34)

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Electrodes, Magnetism, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Etching, Manufacturing, Resistance, Magnetism, Printing, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Silicon, Photoresist materials, Photomasks, System on a chip, Front end of line

Proceedings Article | 21 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Semiconductors, Optical lithography, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Process control, Wafer inspection, Plasma etching, Error control coding, Semiconducting wafers, System on a chip, Overlay metrology, Device simulation, Tin

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Waveguides, Silicon, 3D modeling, Photomasks, Ion implantation, Critical dimension metrology, Light wave propagation

Showing 5 of 34 publications
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