Moon Gyu Sung
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Diffractive optical elements, Polarization, Etching, Quartz, Scanning electron microscopy, Solids, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Edge detection, Quartz, Image segmentation, Image processing, Inspection, Neural networks, Photomasks, Optical simulations, Artificial intelligence, Neurons

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Carbon, Lithography, Light sources, Contamination, Air contamination, Manufacturing, Inspection, Transmittance, Photomasks, Contamination control

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Reticles, Etching, Dry etching, Particles, Manufacturing, Inspection, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Etching, Error analysis, Quantitative analysis, Photomasks, Integrated circuits, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Showing 5 of 9 publications
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