The demand for large area and low cost nanopatterning techniques for optical coatings and photonic devices has
increased at a tremendous rate. At present, it is clear that currently available nanopatterning technologies are unable to
meet the required performance, fabrication-speed, or cost criteria for many applications requiring large area and low cost
nanopatterning. Rolith Inc proposes to use a new nanolithography method - "Rolling mask" lithography - that combines
the best features of photolithography, soft lithography and roll-to-plate printing technologies. We will report on the first
results achieved on a recently built prototype tool and cylindrical mask, which was designed to pattern 300 mm wide
We report a large-area, dual-scale metal transfer method by using a difference in adhesive force. Rigiflex
polyurethane acrylate (PUA) molds with engraved nanoscale patterns were used to transfer metal layers (Au or
Al) to flexible polyethylene terephthalate (PET) substrate. Transfer process was performed sequentially for the
metal layers on ridge and valley regions of the mold, resulting in a dual-scale metal transfer from a single master.
A simple metal wire grid polarizer was fabricated and analyzed using this method.