Mr. Moonsuk Yi Profile

Moonsuk Yi

at Lawrence Berkeley National Lab

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 16 June 2003 Paper

Defect repair for extreme-ultraviolet lithography (EUVL) mask blanks

Moon-Suk Yi, Paul Mirkarimi, Donald Sweeney, Daniel Stearns, Stefan Hau-Riege, Henry Chapman, Anton Barty, Eric Gullikson, W. Miles Clift

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484729

KEYWORDS: Reflectivity, Photomasks, Extreme ultraviolet lithography, Silicon carbide, Multilayers, Carbon, Silicon, Yield improvement, Ion beams, Critical dimension metrology

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Proceedings Article | 27 December 2002 Paper

Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks

James Folta, Christopher Walton, Eric Gulliksong, Ted Liang, Gilbert Shelden, Cindy Larson, Alan Stivers, Barry Lieberman, Moonsuk Yi, Paul Mirkarimi, Michael Penn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468199

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Particles, Gold, Extreme ultraviolet lithography, Semiconducting wafers, Optical spheres, Multilayers

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Proceedings Article | 1 July 2002 Paper

EUVL mask blank repair

W. Miles Clift, Paul Mirkarimi, Donald Sweeney, Moonsuk Yi, Henry Chapman, Anton Barty, Scott Hector, Daniel Stearns

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472313

KEYWORDS: Multilayers, Reflectivity, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Silicon, Ion beams, Molybdenum, Particles, Lithography

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Proceedings Article | 1 July 2002 Paper

At-wavelength inspection of defect smoothing in EUVL masks

Min-Cheol Park, Moonsuk Yi, Jeffrey Bokor, Cindy Larson, Paul Mirkarimi

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472314

KEYWORDS: Extreme ultraviolet lithography, Inspection, Photomasks, Gold, Optical spheres, Scanners, Defect inspection, Multilayers, Reflectivity, Extreme ultraviolet

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Proceedings Article | 7 July 1997 Paper

Evaluation of aerial image in XRL

Srinivas Bollepalli, Mumit Khan, Ohyun Kim, Franco Cerrina, Moonsuk Yi

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275769

KEYWORDS: Image quality, Image processing, Photomasks, Lithography, X-ray lithography, Gold, Image analysis, Semiconducting wafers, X-rays, Image acquisition

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