Morimi Osawa
at Fujitsu Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 March 2013 Paper
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Mirrors, Logic, Lithium, Metals, Logic devices, High volume manufacturing, Analog electronics, Electron beam direct write lithography, Semiconducting wafers, System on a chip

Proceedings Article | 4 March 2008 Paper
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Cadmium, Electroluminescence, Scanning electron microscopy, Photomasks, Line width roughness, Transistors, SRAF, Critical dimension metrology, Eye models

Proceedings Article | 13 March 2006 Paper
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Data modeling, Diffusion, Manufacturing, Monte Carlo methods, Bridges, Design for manufacturing, Optical proximity correction, SRAF, Resolution enhancement technologies

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Diffraction, Light scattering, Manufacturing, Printing, Photomasks, Acquisition tracking and pointing, Optical proximity correction, Semiconducting wafers, Model-based design

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