Morimi Osawa
at Fujitsu Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Mirrors, Logic, Lithium, Metals, Logic devices, High volume manufacturing, Analog electronics, Electron beam direct write lithography, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | March 4, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Cadmium, Electroluminescence, Scanning electron microscopy, Photomasks, Line width roughness, Transistors, SRAF, Critical dimension metrology, Eye models

PROCEEDINGS ARTICLE | March 13, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Data modeling, Diffusion, Manufacturing, Monte Carlo methods, Bridges, Design for manufacturing, Optical proximity correction, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Diffraction, Light scattering, Manufacturing, Printing, Photomasks, Acquisition tracking and pointing, Optical proximity correction, Semiconducting wafers, Model-based design

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top