Dr. Moshe E. Preil
at
SPIE Involvement:
Fellow status | Conference Program Committee | Journal Editorial Board Member | Author
Publications (31)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Wafer-level optics, Oxides, Signal to noise ratio, Reticles, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers

SPIE Journal Paper | September 29, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

PROCEEDINGS ARTICLE | March 28, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Electron beam lithography, Metrology, Optical lithography, Data modeling, Etching, 3D modeling, Photomasks, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Code division multiplexing, Neck, Lithography, Optical lithography, Modulation, Visualization, Ions, Lens design, Optical resolution, Photomasks, Extreme ultraviolet, Directed self assembly, Immersion lithography, Neodymium, Semiconducting wafers

SPIE Journal Paper | March 14, 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Directed self assembly, Critical dimension metrology, Scatterometry, Polymethylmethacrylate, Optical components, Picosecond phenomena, Optical simulations, Chemical elements, Optical lithography, Ellipsometry

SPIE Journal Paper | August 3, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Line edge roughness, Silicon, Scatterometry, Data modeling, Optical components, Scanning electron microscopy, Picosecond phenomena, Chemical elements, Line width roughness, Optical properties

Showing 5 of 31 publications
Conference Committee Involvement (4)
Photomask Technology
17 September 2018 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
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