Dr. Moshe E. Preil
Sr Technical Manager Product Strategy
SPIE Involvement:
Conference Program Committee | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author | Editor
Publications (33)

SPIE Journal Paper | 20 February 2024 Open Access
JM3, Vol. 23, Issue 01, 011001, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011001
KEYWORDS: Advanced packaging, Optical lithography, Front end of line, Packaging, Reliability, Electronic design automation, Chip manufacturing, Yield improvement, Semiconductors, Photoresist processing

Proceedings Article | 27 June 2019 Paper
Moshe Preil, James Westphal
Proceedings Volume 11178, 111780C (2019) https://doi.org/10.1117/12.2536308
KEYWORDS: Reticles, Extreme ultraviolet, Semiconducting wafers, Photomasks, Inspection, Pellicles, Scanners, Stochastic processes, Line edge roughness, Critical dimension metrology

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10451, 104510L (2017) https://doi.org/10.1117/12.2281632
KEYWORDS: Semiconducting wafers, Photomasks, Inspection, Wafer-level optics, Extreme ultraviolet, Reticles, Optical inspection, Oxides, Wafer inspection, Signal to noise ratio

SPIE Journal Paper | 29 September 2016
JM3, Vol. 15, Issue 03, 031610, (September 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031610
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

Proceedings Article | 28 March 2016 Open Access Paper
Proceedings Volume 9780, 978002 (2016) https://doi.org/10.1117/12.2222256
KEYWORDS: Optical lithography, Etching, Lithography, Metrology, Data modeling, Photomasks, Electron beam lithography, Semiconducting wafers, 3D modeling, Tolerancing

Showing 5 of 33 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 16 October 2020

SPIE Conference Volume | 4 November 2019

Conference Committee Involvement (17)
Optical and EUV Nanolithography XXXVIII
23 February 2025 | San Jose, California, United States
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
Photomask Technology
27 September 2021 | Online Only, United States
Showing 5 of 17 Conference Committees
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